Equipment
※ Inductively Coupled Plasma Reactive Ion Etcher (ICPRIE)
- Model : A-Tech ICPRIE
- Amount : 1
- Size / Gas : 6 inch wafer / CH3OH, CH4, H2O, Cl2, HBr, C2F6, O2, N2, He, Ar
- Purchase date : 2005. 03.
- Running state : Normal
※ RF Magnetron Sputtering System
- Model : A-Tech sputter
- Amount : 1
- Size / Gas : 4 inch wafer / N2, O2, Ar
- Purchase date : 2007. 07.
- Running state Normal
※ Plasma Etching System and Asher
- Model : SHA-4D-250R
- Amount : 1
- Size / Gas : 6 inch wafer / C2F6, O2, Ar
- Purchase date : 2003.03.
- Running state : Normal
※ Aerosol Jet Etcher
- Model
- Amount : 1
- Size / Gas : 4 inch wafer / Ar
- Purchase date : 2001. 05.
- Running state : Normal
※ Surface profilometer
- Model : TENCOR P-1
- Amount : 1
- Size : 6 inch wafer
- Purchase date : 2006. 11.
- Running state : Normal
※ Furnace
- Model : DS-KT-OT-120
- Amount : 1
- Size / Gas : 4 inch wafer / N2, O2, Ar
- Purchase date : 2001. 01.
- Running state : Normal
※ Optical Emission Spectroscopy (OES)
- Model : MAYA PRO 2000 (Ocean Optics)
- Amount : 1
- Purchase date : 2014. 01.
- Running state : Normal
※ Spin coater
- Model : SP-3000
- Amount : 1
- Size : 4 inch wafer /
- Purchase date : 2001. 01.
- Running state : Normal
※ Dry Oven
※ Microscope
※ Balance
※ Hot Plate
※ Sonicator