Domestic Journals
Title | Journal Name | Year |
Influence of Selenization Pressure on Properties of CIGS Absorber Layer Prepared by RF Sputtering | CURRENT PHOTOVOLTAIC RESEARCH | 2016 |
| Etch characteristics of CoFeB thin films and magnetic tunnel junction stacks in a H2O/CH3OH plasma | Korean J. Chem. Eng | 2014 |
Effect of KCN Treatment on Cu-Se Secondary Phase of One-step Sputter-deposited CIGS Thin Films Using Quaternary Target | Current Photovoltaic Research
| 2014 |
Influence of Heat Treatment on the Structural, Electrical and Optical Properties of Aluminum-Doped Zinc Oxide Thin Films Prepared by Magnetron Sputtering | Current Photovoltaic Research
| 2013 |
Characterization of Cu(In‚Ga)Se2 Thin Films Prepared by RF Magnetron Sputtering Using a Single Target without Selenization | J. Ind. Eng. Chem.
| 2013 |
화학용액증착법에 의하여 증착된 CdS 박막의 특성에 대한 Cd 농도의 영향 | 공업화학 (APPL. CHEM. ENG.: APPLIED CHEMISTRY FOR ENGINEERING) | 2012 |
DC 마그네트론 스퍼터링 방법에 의해 증착된 Mo 박막의 특성 | KOREAN CHEM. ENG. RES | 2011 |
플렉시블 염료 감응형 솔라셀의 효율에 미치는 indium zinc oxide 투명전극의 영향 | KOREAN CHEM. ENG. RES. | 2009 |
Effect of Deposition Parameters on the Properties of TiN Thin Films Deposited by rf Magnetron Sputtering | KOREAN CHEM. ENG. RES. | 2008 |
Inductively coupled plasma reactive ion etching of titanium nitride thin films in a Cl2/Ar plasma | J. IND. ENG. CHEM. | 2008 |
High Density Plasma Etching of Nickel Thin Films Using a Cl2/Ar Plasma | J. IND. ENG. CHEM. | 2007 |
Optical and electrical properties of rf-sputtered indium zinc oxide films | J. IND. ENG. CHEM. | 2007 |
Cl2/Ar 플라즈마를 이용한 ZnO 박막의 식각 특성 | J. KOREAN IND. ENG. CHEM. | 2007 |
VOx 박막의 구조적 특성과 전기적 특성에 대한 열처리 영향 | J. KOREAN IND. ENG. CHEM. | 2006 |
Indium Zinc Oxide 박막 특성에 대한 O2 농도와 열처리 온도의 영향 | J. KOREAN IND. ENG. CHEM. | 2006 |
Si nanodot 배열의 형성을 위한 NbOx 나노기둥 마스크의 식각 특성 | J. KOREAN IND. ENG. CHEM. | 2006 |
Stduy on Etch Characteristics of CoTb and CoZrNb Magnetic Films Using a Hard Mask in a Cl2/O2/Ar plasma | J. IND. ENG. CHEM. | 2005 |
Formation of Silicon Nanodot Arrays by Reactive Ion Etching Using Self-Assembled Tantalum Oxide Mask | J. IND. ENG. CHEM. | 2005 |
고밀도 플라즈마 식각에 의한 CoTb과 CoZrNb 박막의 식각 특성 | KOREAN CHEM. ENG. RES. | 2005 |
자성 메모리의 적용을 위한 나노미터 크기로 패턴된 magnetic tunnel junction의 식각 특성 | J. KOREAN IND. ENG. CHEM. | 2005 |
SiNx 박막을 이용한 Si nanodot의 형성 | J. KOREAN IND. ENG. CHEM. | 2005 |
반응성 직류 마그네트론 스퍼터링에 의하여 증착된 IZO 박막의 특성 | J. KOREAN IND. ENG. CHEM. | 2004 |
Cl2/Ar 및 C2F6/Ar discharge를 이용한 NiFe, CoFe 및 IrMn 자성박막의 유도 결합 플라즈마 반응성 이온 식각 | J. KOREAN IND. ENG. CHEM. | 2004 |
Wet Etch Characteristics of NiFe and CoFe Magnetic Thin Films | J. IND. ENG. CHEM. | 2004 |
Nanometer-Sized Patterning of Polysilicon Thin Films by High Density Plasma Etching Using Cl2 and HBr gases | KOREAN J. CHEM. ENG. | 2003 |
강유전체 Bi3.25La0.75Ti3O12 박막의 증착에 대한 | J. KOREAN IND. ENG. CHEM. | 2003 |
Characteristics of Ge2Sb2Te5 Thin Films Deposited by DC Magnetron Sputtering | J. IND. ENG. CHEM. | 2003 |
자성박막의 습식 식각특성 | 전기전자재료학회논문지, 15,105 | 2002 |
화학 용액 증착법에 의하여 제조된 Bi4Ti3O12 박막의 특성 | J. KOREAN IND. ENG. CHEM., 13(3), 236 | 2002 |
Growth and Characterization of SrBi2Ta2O9 thin films by chemical solution deposition | J. IND. ENG. CHEM. 8(3), 253-256 | 2002 |
Chemical Etching of NiFe and IrMn Thin Films | J. IND. ENG. CHEM. 8(3), 257-261 | 2002 |
Inductively Coupled Plasma Etching of Pb(ZrXTi 1-X)O3 Thin Films in Cl2/C2F6/Ar and HBr/Ar Plasmas | KOREAN J. CHEM. ENG., 19(3), 524-528 | 2002 |
TiAlN 박막의 Electrical resistivity에 대한 증착 변수의 영향 | HWAHAK KONGHAK | 2002 |
Inductively Coupled Plasma Reactive Ion Etching of Ferroelectric Capacitors | KOREAN INSTITUTE OF CHEMICAL ENGINEERS | 2001 |
CAE를 이용한 TV Speaker Grille 사출 성형의 최적화 | POLYMER | 2001 |
Metal organic Chemical Vapor Deposition of Ferroelectric Pb(ZrXTi1-X)O3 Thin Films | -KOREAN J. OF CHEM. ENG.. 14(2), 136 | 1997 |