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Domestic Journals

Title

Journal Name

Year

Etch characteristics of CoFeB thin films and magnetic tunnel junction stacks in a H2O/CH3OH plasma

Korean J. Chem. Eng

 

2014

Effect of KCN Treatment on Cu-Se Secondary Phase of One-step Sputter-deposited CIGS Thin Films Using Quaternary Target

Current Photovoltaic Research

 

2014

Influence of Heat Treatment on the Structural, Electrical and Optical Properties of Aluminum-Doped Zinc Oxide Thin Films Prepared by Magnetron Sputtering

Current Photovoltaic Research

 

2013

Characterization of Cu(In‚Ga)Se2 Thin Films Prepared by RF Magnetron Sputtering Using a Single Target without Selenization

J. Ind. Eng. Chem.

 

2013

화학용액증착법에 의하여 증착된 CdS 박막의 특성에 대한 Cd 농도의 영향

공업화학 (APPL. CHEM. ENG.: APPLIED CHEMISTRY FOR ENGINEERING)

2012

DC 마그네트론 스퍼터링 방법에 의해 증착된 Mo 박막의 특성

KOREAN CHEM. ENG. RES

2011

플렉시블 염료 감응형 솔라셀의 효율에 미치는 indium zinc oxide 투명전극의 영향

KOREAN CHEM. ENG. RES.

2009

Effect of Deposition Parameters on the Properties of TiN Thin Films Deposited by rf Magnetron Sputtering

KOREAN CHEM. ENG. RES.

2008

Inductively coupled plasma reactive ion etching of titanium nitride thin films in a Cl2/Ar plasma

J. IND. ENG. CHEM.

2008

High Density Plasma Etching of Nickel Thin Films Using a Cl2/Ar Plasma

J. IND. ENG. CHEM.

2007

Optical and electrical properties of rf-sputtered indium zinc oxide films

J. IND. ENG. CHEM.

2007

Cl2/Ar 플라즈마를 이용한 ZnO 박막의 식각 특성

J. KOREAN IND. ENG. CHEM.

2007

VOx 박막의 구조적 특성과 전기적 특성에 대한 열처리 영향

J. KOREAN IND. ENG. CHEM.

2006

Indium Zinc Oxide 박막 특성에 대한 O2 농도와 열처리 온도의 영향

J. KOREAN IND. ENG. CHEM.

2006

Si nanodot 배열의 형성을 위한 NbOx 나노기둥 마스크의 식각 특성

J. KOREAN IND. ENG. CHEM.

2006

Stduy on Etch Characteristics of CoTb and CoZrNb Magnetic Films Using a Hard Mask in a Cl2/O2/Ar plasma

J. IND. ENG. CHEM.

2005

Formation of Silicon Nanodot Arrays by Reactive Ion Etching Using Self-Assembled Tantalum Oxide Mask

J. IND. ENG. CHEM.

2005

고밀도 플라즈마 식각에 의한 CoTb CoZrNb 박막의 식각 특성

KOREAN CHEM. ENG. RES.

2005

자성 메모리의 적용을 위한 나노미터 크기로 패턴된 magnetic tunnel junction의 식각 특성

J. KOREAN IND. ENG. CHEM.

2005

SiNx 박막을 이용한 Si nanodot의 형성

J. KOREAN IND. ENG. CHEM.

2005

반응성 직류 마그네트론 스퍼터링에 의하여 증착된 IZO 박막의 특성

J. KOREAN IND. ENG. CHEM.

2004

Cl2/Ar  C2F6/Ar discharge를 이용한 NiFe, CoFe  IrMn 자성박막의 유도 결합 플라즈마 반응성 이온 식각

J. KOREAN IND. ENG. CHEM.

2004

Wet Etch Characteristics of NiFe and CoFe Magnetic Thin Films

J. IND. ENG. CHEM.

2004

Nanometer-Sized Patterning of Polysilicon Thin Films by High Density Plasma Etching Using Cl2 and HBr gases

KOREAN J. CHEM. ENG.

2003

강유전체 Bi3.25La0.75Ti3O12 박막의 증착에 대한

J. KOREAN IND. ENG. CHEM.

2003

Characteristics of Ge2Sb2Te5 Thin Films Deposited by DC Magnetron Sputtering

J. IND. ENG. CHEM.

2003

자성박막의 습식 식각특성

전기전자재료학회논문지, 15,105

2002

화학 용액 증착법에 의하여 제조된 Bi4Ti3O12 박막의 특성

J. KOREAN IND. ENG. CHEM., 13(3), 236

2002

Growth and Characterization of SrBi2Ta2O9 thin films by chemical solution deposition

J. IND. ENG. CHEM. 8(3), 253-256

2002

Chemical Etching of NiFe and IrMn Thin Films

J. IND. ENG. CHEM. 8(3), 257-261

2002

Inductively Coupled Plasma Etching of Pb(ZrXTi 1-X)O3 Thin Films in Cl2/C2F6/Ar and HBr/Ar Plasmas

KOREAN J. CHEM. ENG., 19(3), 524-528

2002

TiAlN 박막의 Electrical resistivity에 대한 증착 변수의 영향

HWAHAK KONGHAK

2002

Inductively Coupled Plasma Reactive Ion Etching of Ferroelectric Capacitors

KOREAN INSTITUTE OF CHEMICAL ENGINEERS

2001

CAE를 이용한 TV Speaker Grille 사출 성형의 최적화

POLYMER

2001

Metal organic Chemical Vapor Deposition of Ferroelectric Pb(ZrXTi1-X)O3 Thin Films

-KOREAN J. OF CHEM. ENG.. 14(2), 136

1997

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