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International Journals

Title

Journal Name

Year

Etch Characteristics of Ru Thin Films Using O2/Ar, CH4/Ar, and O2/CH4/Ar Plasmas

Thin Solid Films

2016

Effect of process pressure and substrate temperature on CdS buffer layers deposited by using RF sputtering for Cu(In, Ga)Se2 solar cells

Journal of the Korean Physical Society

2016

Novel spherical TiO2 aggregates with diameter of 100nm for efficient mesoscopic perovskite solar cells

Nano Energy

2016

Characterization of Zn(O, S) Buffer Layers for Cu(In, Ga)Se2 Solar Cells

Journal of Nanoscience and Nanotechnology

2016

Inductively Coupled Plasma Reactive Ion Etching of Magnetic Tunnel Junction Stacks in a CH3COOH/Ar Gas

ECS Solid State Letters

2015

Inductively coupled plasma reactive ion etching of CoFeB magnetic thin films in a CH3COOH/Ar gas mixture

Vacumm

2015

Influence of oxygen on characteristics of Zn(O, S) thin films deposited by RF magnetron sputtering

J. Vac. Sci. Technol. A

2015

Effect of O2 on etch characteristics of Co2MnSi thin films in CH4/O2/Ar gas mixture

J. Vac. Sci. Technol. A

2015

High density plasma reactive ion etching of Ru thin films using non-corrosive gas mixture

Thin Solid Films

2015

Inductive couple plasma reactive ion etching characteristics of TiO2 thin films

Thin Solid Films

2015

Dry etching of Co2MnSi magnetic thin films using a CH3OH/Ar based inductively coupled plasma

Vacumm
   

2015

Influence of Post- treatment on properties of Cu(In,Ga)Se2 thin films deposited by RF magnetron sputtering using a quaternary sincgle target for photovoltaic devices

Thin Solid Films
   

2014

Etch characteristics of MgO thin films in Cl2/Ar, CH3OH/Ar and CH4/Ar plasmas

VACUUM

2014

Characteristics of CdS Thin Films Deposited on Glass and Cu(In,Ga)Se2 Layer Using Chemical Bath Deposition

Thin Solid Films

 

2013

Inductively Coupled Plasma Reactive Ion Etching of Magnetic Tunnel Junction Stacks Using H2O/CH4 Mixture

Thin Solid Films

 

2013

Structural and electrical properties of radio frequency magnetron sputtered Cu(InxGa1-x)Se2 thin films with additional post-heat treatment

Thin Solid Films

 

2013

Investigation on Etch Characteristics of FePt Thin Films Using a H2O/Ar Plasma

Microelectronic Engineering

2013

Influence of O2 Gas on Etch Profile of Magnetic Tunnel Junction Stacks Etched in a CH4/O2/Ar Plasma

CS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY

2012

Inductively coupled plasma reactive ion etching of FePt magnetic thin films in a CH4/O2/Ar plasma

THIN SOLID FILMS

2012

Effect of the Annealing Process on CuInS2 Thin Films Prepared by Using Aerosol Jet Deposition

J. KOREAN PHYS. SOC

2012

Characterization of CuInS2 thin films prepared by aerosol jet deposition

THIN SOLID FILMS

2012

Inductively coupled plasma reactive ion etching of IrMn magnetic thin films using a CH4/O2/Ar gas

THIN SOLID FILMS

2012

High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma

THIN SOLID FILMS

2012

Evolution of Etch Profile of Magnetic Tunnel Junction Stacks Etched in a CH3OH/Ar Plasma

J. ELECTROCHEM. SOC.

2012

High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma

THIN SOLID FILMS

2011

Inductively Coupled plasma Reactive Ion Etching of IrMn Magnetic

THIN SOLID FILMS

2011

Etch Characteristics of IrMn Thin Films Using an Inductively Coupled Plasma of CH3OH/Ar

THIN SOLID FILMS

2011

Etch characteristics of FePt magnetic thin films using inductively coupled plasma reactive ion etching

THIN SOLID FILMS

2011

Evolution of etch profile in etching of CoFeB thin films using high density plasma reactive ion etching

THIN SOLID FILMS

2011

Investigation on etch characteristics of MgO thin films using a HBr/Ar plasma

THIN SOLID FILMS

2011

Growth Mechanism of CdS NanoFilms Prepared by Chemical Bath Deposition

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

2011

Investigation on Etch Characteristics of Nanometer-Sized Magnetic Tunnel Junction Stacks Using a HBr/Ar Plasma

JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

2011

Performance Improvement of Dye-Sensitized Solar Cells by Surface Patterning of Fluorine-doped Tin Oxide Transparent Electrodes

THIN SOLID FILMS

2011

Characteristics of Indium Zinc Oxide Thin Films Prepared by Direct Current Magnetron Sputtering For Flexible Solar Cells

SOLAR ENERGY MATERIAL & SOLAR CELLS

2011

Inductively Coupled Plasma Reactive Ion Etching of Titanium Thin Films Using a Cl2/Ar Gas

VACUUM

2010

Etch Characteristics of Gallium Indium Zinc Oxide Thin Films in a HBr/Ar Plasma

SURFACE & COATINGS TECHNOLOGY

2010

Inductively Coupled Plasma Reactive Ion Etching of Gallium Indium Zinc Oxide Thin Films Using Cl2/Ar Gas Mix

J. JAPAN. APPL. PHYS

2010

Etch Characteristics of Indium Zinc Oxide Thin Films in a C2F6/Ar Plasma

THIN SOLID FILMS



Etch characteristics of indium zinc oxide thin films using inductively coupled plasma of a Cl2/Ar gas

THIN SOLID FILMS

2009

Inductively Coupled Plasma Etching of Indium Zinc Oxide Thin Films with HBr/Ar Discharges

J. ELECTROCHEM. SOC.

2008

Effect of oxygen concentration on properties of indium zinc oxide thin films for flexible dye-sensitized solar cell

JPN J. APPL. PHYS.

2008

Inductively coupled plasma reactive ion etching of ZnO films in HBr/Ar plasma

THIN SOLID FILMS

2008

Etch characteristics of magnetic tunnel junction stack with nanometer-sized patterns for magnetic random access memory

THIN SOLID FILMS

2008

Fabrication of carbon nanotube paste using photosensitive polymer for field emission display

COLLOIDS AND SURFACES A

2008

Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching for Oxide Resistive Random Access Memory Application

ELECTROCHEMICAL AND SOLID-STATE LETTERS

2008

Etch Characteristics of Magnetic Tunnel Junction Stack Using a High Density Plasma in a HBr/Ar gas

PHYSICA STATUS SOLID

2007

Effect of O2 Concentration on Metal-Insulator Transition Properties of Vanadium Oxide Thin Films Prepared by Radio Frequency Magnetron Sputtering

THIN SOLID FILMS

2007

Characteristics of Indium Zinc Oxide Thin Films Deposited by Radio Frequency Reactive Magnetron Sputtering for Solar Cells Application

SOLID STATE PHENOMENA

2007

Inductively Coupled Plasma Reactive Ion Etching of GeSbTe Thin Films in a HBr/Ar Gas

INTEGRATED FERROELECTRICS

2007

High Density Plasma Etching of IrRu Thin Films as a New Electrode for FeRAM

INTEGRATED FERROELECTRICS

2006

High Density Plasma Etching of Amorphous CoZrNb Films for Thin Film Magnetic Devices

THIN SOLID FILMS

2006

Synthesis of nanodot arrays using self-assembled niobium oxide nanopillar mask by reactive ion etching

STUDIES IN SURFACE SCIENCE AND CATALYSIS

2006

Inductively coupled plasma reactive ion etching of Co2MnSi magnetic films for magnetic random access memory

STUDIES IN SURFACE SCIENCE AND CATALYSIS

2006

Inductively coupled plasma reactive ion etching of Co2MnSi magnetic films for magnetic random access memory

STUDIES IN SURFACE SCIENCE AND CATALYSIS

2006

Etch characteristics of CoFeSiB magnetic films using inductively coupled plasma reactive ion etching for magnetic random access memory

INTEGRATED FERROELECTRICS

2006

Formation of Si nanostructures using dry etching with self-organized metal oxide nanopillar masks

INTEGRATED FERROELECTRICS

2006

Metal-insulator transitions in polycrystalline VOx thin films

INTEGRATED FERROELECTRICS

2006

Investigation on etch characteristics of GeSbTe thin films for phase-change memory

INTEGRATED FERROELECTRICS

2006

Nanometer-sized etching of magnetic tunnel junction stack for magnetic random access memory

J. MAGNETISM AND MAGNETIC MATERIALS

2006

High-density plasma etching of CoFeSiB magnetic films with hard mask

J. MAGNETISM AND MAGNETIC MATERIALS

2006

High Density Plasma Etching of IrRu Thin Films as a New Electrode for FeRAM

INTEGRATED FERROELECTRICS

2006

ELECTRICAL CHARACTERIZATION OF NICKEL OXIDE THIN FILMS DEPOSITED BY REACTIVE SPUTTERING FOR MEMORY APPLICATIONS

INTEGRATED FERROELECTRICS

2005

Shape Change of Self-Organized NbOx Nanopillar Arrays by High Density Plasma Etching

ELECTROCHEMICAL AND SOLID-STATE LETTERS

2005

Effect of Different Film Preparation Procedures on the Thermal, Morphological and Mechanical Properites of Pure and Calcite-Filled HDPE Films

JOURNAL OF APPLIED POLYMER SCIENCE

2004

Influence of Etch Gas on High Density Plasma Etching of Polysilicon Thin Films with Nanometer-Sized Patterns

ELECTROCHEMICAL AND SOLID-STATE LETTERS

2004

Influence of Wet Chemical Cleaning on Properties of Magnetic Tunnel Junction Stack for Magnetic RAM

ELECTROCHEMICAL AND SOLID-STATE LETTERS

2004

Synthesis of Si Nanostructures via Self-organization Pillar Mask

CHEMISTRY MATERIALS

2004

Etch characteristics of CoZrNb and CoTb magnetic thin films in a high density plasma

PHYS. STAT. SOL.(A)

2004

Nonlithographic SiO2 nanodot arrays via template synthesis approach

JPN. J. APPL. PHYS.

2004

Influence of Process Parameters on the Characteristics of Indium Zinc Oxide Thin Films Deposited by DC magnetron Sputtering

THIN SOLID FILMS

2004

Nanometer-sized patterning of polysilicon thin films by high density plasma etching

THIN SOLID FILMS

2004

Effect of La Doping on Structural and Electrical Properties of Ferroelectric Bi4-XLaXTi3O12 Thin Films Prepared by Chemical Solution Deposition

THIN SOLID FILMS

2003

High Density Plasma Etching of Iridium Thin Films in a Cl2/O2/Ar Plasma

J. ELECTROCHEM. SOC

2003

Effect of Etch Gas on Dry Etching of Ferroelectric Bi3.25La0.75Ti3O12 Thin Films

JPN. J. APPL. PHYS.

2003

Etch characteristics of Ferroelectric (Bi4-xLaX)Ti3O12 Thin Films in an Inductively Coupled Plasma

INTEGRATED FERROELECTICS

2002

Inductively coupled plasma etching of a Pb(ZrXTi1-X)O3 thin film in a HBr/Ar plasma

MICROELECTRONIC ENGINEERING, 63, 353-361

2002

Effect of Etch Gases on Iridium Etching Using a Hard Mask

INTEGRATED FERROELECTICS, 39, 119

2001

Etch Behavior of PZT films Using a TiO2 Hard Mask

J. ELECTROCHEM. SOC. 148, C353

2001

Etch Characteristics of Iridium in Chlorine-Containing and Fluorine-Containing Gas Plasmas

J. VAC. SCI.AND TECHNOL. A 19, 2400

2001

Platinum etching by using a TiO2 hard mask in O2/Cl2/Ar plasma

J. VAC. SCI. AND TECHNOL. A 18, 835

2000

Effect of Pre-Annealing on Physical and Electrical Properties of SrBi2Ta2O9 Thin Films Prepared by Chemical Solution Deposition

THIN SOLID FILMS, 354, 111

1999

Reactive Ion Etching of Pb(ZrXTi1-X)O3 Thin Films in an Inductively Coupled Plasma

J. VAC. SCI. AND TECHNOL. B 16, 1894

1998

Study on Fence-Free Platinum etching Using Chlorine-Based Gases in Inductively Coupled Plasma

J. ELECTROCHEM. SOC., 144, L294

1997

Effects of Substrate Modification on the Growth and Characteristics of MOCVD PZT

INTEGRATED FERROELECTRICS, 17, 67

1997

Fabrication and Comparison of Ferroelectric Capacitor Structures for Memory Applications

INTEGRATED FERROELECTRICS, 16, 139

1997

Integration of Ferroelectric Capacitors using Multilayered Electrode

INTEGRATED FERROELECTRICS, 16, 97

1997

Etching Effects to PZT Capacitors with RuOX/Pt Electrode by using Inductively Coupled Plasma

INTEGRATED FERROELECTRICS, 16, 149

1997

Effects of Oxide Electrode on PbZrXTi1-XO3 Thin Films Prepared by Metalorganic Chemical Vapor Deposition

JPN. J. APPL. PHYS., 36, 72

1997

Etching Effects on Ferroelectric Capacitors with Multilayered Electrodes

JPN. J. APPL. PHYS.,36, 2747

1997

Study on Property Variation due to the Interface between PZT and Electrode

INTEGRATED FERROELECTRICS, 13, 97

1996

Etching Effects on Ferroelectric Capacitors with Multilayered Electrodes

INTEGRATED FERROELECTRICS, 13, 129

1996

Dry Etching of Pt/Pb(ZrXTi1-X)O3/Pt Thin Film Capacitors in an Inductively Coupled Plasma (ICP)

INTEGRATED FERROELECTRICS, 11, 259

1995

Reactive Cluster Beam Etching of Fine Patterns

APPL. PHYS. LETT., 63(24), 3341

1993


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Department of Chemical Engineering, Inha University
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