International Conferences
|
Title |
Name of the conference |
Year |
| Dry Etching of Copper Thin Films in High Density Plasma of Organic Acids | 2018 ICMAP |
2018 |
| Effect of Non-Corrosive Gas Mixture on Etching of Cu Thin Film Using Inductively Coupled Plasma Reactive Ion Etching | 2018 ICMAP | 2018 |
Etch Characteristics of Nanometer Patterned Magnetic Tunnel Junction Stacks Using Pulse-Modulated RF Source Plasma | 2018 ICMAP | 2018 |
Investigation on aerosol jet etching for thin film patterning | 233rd ElectroChemical Society Meeting | 2018 |
The etching characteristics of Cu thin film surface using inductively coupled plasma | 233rd ElectroChemical Society Meeting | 2018 |
Charaterization of Zn(O, S) buffer layers for Cu(In, Ga)Se2 solar cells | 13th Kprea-Japan Frontier Photoscience Symposium | 2017 |
Effect of Two-Step Deposition on CuInS2 Thin Films Prepared Using Aerosol Jet Deposition Method | 13th Kprea-Japan Frontier Photoscience Symposium | 2017 |
Dry Etching of Nanometer-scale Patterned CoFeB Thin Films under Pulse Modilated Plasma | AVS 64th International symposium & exhibition | 2017 |
Etch Characteristics of Magnetic Tunnel Junction Stacks using Pulse-modulated RF Source Plasma | AVS 64th International symposium & exhibition | 2017 |
Nanometer-scale Etch Characteristics of TiN Thin Films using Inductively Coupled Plasma of Cl2/C2F6/Ar | AVS 64th International symposium & exhibition | 2017 |
Etch characteristics comparison of nanometer scale TiN hard masked MTJ stacks etched in a constant wave and pulse modulated plasma | Proceedings of International Symposium on Dry Process | 2016 |
Study on Etch Characteristics of CoFeB thin films with Nanometer-Sized Patterns using Pulse-Time Modulated Plasma | Proceedings of International Symposium on Dry Process | 2016 |
Investigation on etch characteristics of Palladium thin films using CH3COOH/Ar gas. | International Conference on Microelectronics and Plasma Technology 2016 | 2016 |
Nano meter-Size Patterning of TiN Thin Films Using Inductively Coupled Plasma of Cl2/C2F6/Ar | International Conference on Microelectronics and Plasma Technology 2016 | 2016 |
Anisotrpic etching of CoFeB magnetic thin films in C2H5OH/Ar plasma | International Conference on Microelectronics and Plasma Technology 2016 | 2016 |
Comparison of etch characteristic of Palladium thin films in C, H, O containing gas mixtures. | NANO KOREA 2016 | 2016 |
Nano Etching of TiN Thin Films with Nanometer-Sized Patterns Using Inductively Coupled Plasma Reactive Ion Etching | NANO KOREA 2016 | 2016 |
| Etch Characteristics of TiN Thin Films Masked with Nanometer-Sized Patterns | The 3rd USA International Conference on Surfaces, Coatings and NanoStructured Materials (NANOSMAT-USA) | 2016 |
|
Inductively Coupled Plasma Reactive Ion Etching of Magnetic Tunnel Junction Stacks Using Various Non-Corrosive Gas mixtures
|
The 3rd USA International Conference on Surfaces, Coatings and NanoStructured Materials (NANOSMAT-USA) |
2016 |
|
Etching of Palladium thin films using C2H5OH/Argasmixture
|
The 3rd USA International Conference on Surfaces, Coatings and NanoStructured Materials (NANOSMAT-USA) |
2016 |
|
Dry etching of Magnetic Tunnel Junction Stacks in a CH3COOH/Ar Gas Mixture
|
International Conference on Chemical, Metallurgy and Material Science Engineering (CMMSE-2015) |
2015 |
|
Etch Characteristics of Ta Thin Films Using Halogen Containing Gas Mixtures in Inductively Coupled Plasma for Hard Mask Applications |
International Conference on Chemical, Metallurgy and Material Science Engineering (CMMSE-2015) |
2015 |
|
The Effect of C, H and O Elements on Etching Ru Thin Films using Inductively Coupled |
International Conference on Chemical, Metallurgy and Material Science Engineering (CMMSE-2015) |
2015 |
|
Characterization of Zn(O,S) Buffer Layers for Cu(In,Ga)Se2 Solar Cells
|
Pacific Rim Symposium on Surfaces, Coatings & Interfaces 2014 |
2014 |
|
Inductively Coupled Plasma Reactive Ion Etching of CoFeB Thin Films Using a CH3COOH/Ar Gas Mixture |
Pacific Rim Symposium on Surfaces, Coatings & Interfaces 2014 |
2014 |
|
Etch Characteristics of Co2MnSi Thin Films in CH4/O2/Ar Plasmas
|
Pacific Rim Symposium on Surfaces, Coatings & Interfaces 2014 |
2014 |
|
Influence of Selenization Process on Cu(InxGa1-x)Se2 Absorber Layer Prepared by RF Sputtering using Single Quaternary Target |
International Conference on Microelectronics and Plasma Technology 2014 (ICMAP 2014) |
2014 |
|
Characteristics of RF-sputtered CdS Buffer Layers for Cu(In,Ga)Se2 Solar Cells |
International Conference on Microelectronics and Plasma Technology 2014 (ICMAP 2014) |
2014 |
|
High density plasma reactive ion etching of Ru thin films using non-corrosive gas mixture |
International Conference on Microelectronics and Plasma Technology 2014 (ICMAP 2014) |
2014 |
|
Inductive Couple Plasma Reactive Ion Etching Characteristics of TiO2 Thin Films |
International Conference on Microelectronics and Plasma Technology 2014 (ICMAP 2014) |
2014 |
|
Comparison of Etch Characteristics of CoFeB Magnetic Thin films Using CH3OH, CH4 and H2O Plasmas |
The 35th International Symposium on Dry Process (DPS 2013) |
2013 |
|
Influence of Post-treatment on Properties of CIGS Thin Films Deposited by RF Magnetron Sputtering using a Quaternary Single Target for Photovoltaic Devices |
International Thin Films Conference (TACT 2013) |
2013 |
|
Effect of H2O gas on Etch Characteristics of Magnetics Tunnel Junctions Stacks Using a H2O/CH3OH Plasma |
The 35th International Symposium on Dry Process (DPS 2013) |
2013 |
|
Sung Hee Jung, Chee Won Chung , “Characterization of multi-stacks CIGS thin films by RF magnetron sputtering using Cu(In1-xGax)Se2 single quaternary targets
|
Global Photovoltaic Conference 2013 |
2013. |
|
Conformal contact printing of thin metal patterns |
2013 Conference on Nanomaterials |
2013. |
|
Investigation on Etch Characteristics of MgO Thin Films Using a H2O/CH4/Ar Plasma |
IUMRS-ICA 2012 (International Union of Materials Research Society - International Conference in Asia) |
2012 |
|
Etch Characteristics of CoFeB Magnetic Thin Films Using High Density Plasma of a H2O/CH4/Ar Gas Mixture |
IUMRS-ICA 2012 (International Union of Materials Research Society - International Conference in Asia). |
2012 |
|
Electrical and structural properties of CIGS thin films deposited by RF magnetron sputtering using a Cu(In1-xGax)Se2 single target", |
The 4th International Conference on Microelectronics and Plasma Technology (ICMAP) |
2012 |
|
Inductively Coupled Plasma Reactive Ion Etching of Magnetic Tunnel Junction Stacks Using a H2O/Ar Mixture |
The 4th International Conference on Microelectronics and Plasma Technology (ICMAP) |
2012 |
|
Investigation on Etch Characteristics of FePt Thin Films Using a H2O/Ar Plasma |
The 4th International Conference on Microelectronics and Plasma Technology (ICMAP). |
2012 |
|
Effect of Two-Step Deposition on CuInS2 Thin Films Prepared Using Aerosol Jet Deposition Method |
The 4th International Conference on Microelectronics and Plasma Technology (ICMAP). |
2012 |
|
Characterization of Copper Indium Gallium Selenide Thin Films Prepared by RF Magnetron Sputtering Using a Single Target |
The third international conference on microelectronics and plasma technology (ICMAP) |
2011 |
|
Structural and Optical Properties of CuInS2 Thin Films Prepared by Aerosol Jet Deposition |
The third international conference on microelectronics and plasma technology (ICMAP) |
2011 |
|
High Density Plasma Reactive Ion Etching of CoFeB Magnetic Thin Films Using a CH4/Ar Plasma |
The third international conference on microelectronics and plasma technology (ICMAP) |
2011 |
|
Inductively Coupled plasma Reactive Ion Etching of IrMn Magnetic Thin Films in a CH4/Ar gas |
The third international conference on microelectronics and plasma technology (ICMAP) |
2011 |
|
Inductively Coupled Plasma Reactive Ion Etching of Nanometer-Patterned Magnetic Tunnel Junction Stack for STT-MRAM |
1st International Conference of Asian Union of Magnetic Societies (ICAUMS) |
2010 |
|
Etch Characteristics of IrMn Thin Films Using an Inductively Coupled Plasma of CH3OH/Ar |
1st International Conference of Asian Union of Magnetic Societies (ICAUMS) |
2010 |
|
Etch Characteristics of FePt Magnetic Thin Films Using Inductively Coupled Plasma Reactive Ion Etching |
1st International Conference of Asian Union of Magnetic Societies (ICAUMS) |
2010 |
|
Investigation on Etch Characteristics of Nanometer-Sized Magnetic Tunnel Junction Stacks Using a HBr/Ar Plasma |
10th International Conference on Nanotechnology and IEEE Nano |
2010 |
|
Growth Mechanism of CdS Nano-Films Prepared by Chemical Bath Deposition |
10th International Conference on Nanotechnology and IEEE Nano |
2010 |
|
Investigation on Etch Characteristics of MgO thin films Using a HBr/Ar Plasma |
10th Asia-Pacific Conference on Plasma Science and Technology (APCPST) |
2010 |
|
Evolution of Etch Profile in Etching of CoFeB Thin Films Using High Density Plasma Reactive Ion Etching |
10th Asia-Pacific Conference on Plasma Science and Technology (APCPST) |
2010 |
|
Structural, Electrical and Optical Properties of Aluminum-Doped Zinc Oxide Thin Films Prepared by Magnetron Sputtering |
10th Asia-Pacific Conference on Plasma Science and Technology (APCPST) |
2010 |
|
Performance Improvement of Dye-Sensitized Solar Cell by Surface Patterning of FTO Transparent Electrode |
19th International Photovoltaic Science and Engineering Conference and Exhibition (PVSEC) |
2009 |
|
Characteristics of Indium Zinc Oxide Thin Films Prepared by Direct Current Magnetron Sputtering For Flexible Solar Cells |
19th International Photovoltaic Science and Engineering Conference and Exhibition (PVSEC) |
2009 |
|
Inductively Coupled Plasma Reactive Ion Etching of Gallium Indium Zinc Oxide Thin Films in Cl2/Ar Gas Mix |
The 31th International Symposium on Dry Process (DPS) |
2009 |
|
Performance Enhancement in Dye-Sensitized Solar Cells by Surface Modification of Transparent Conducting Oxide Electrode on Flexible Substrate |
2nd International Conference on Microelectronics and Plasma Technology (ICMAP) |
2009 |
|
Etch Characteristics of Gallium Indium Zinc Oxide Thin Films in a HBr/Ar Plasma |
International Conference on Plasma Surface Engineering (AEPSE) |
2009 |
|
Etch Characteristics of Indium Zinc Oxide Thin Films Using Inductively Coupled Plasma of a Cl2/Ar gas |
The 1st International Conference on Materials and Plasma Technology |
2008 |
|
High Density Plasma Etching of Magnetic Tunnel Junction Stacks with Nanometer-Sized Pattern in a Cl2/Ar Gas Mix |
The 1st International Conference on Materials and Plasma Technology |
2008 |
|
The Effect on Electrical Property of Etched Magnetic Tunnel Junction Stack in Cl2/Ar and HBr/Ar Plasma |
The 1st International Symposium on Advanced Magnetic Materials |
2007 |
|
Etch Characteristics of Magnetic Tunnel Junction Stack Using a High Density Plasma in a HBr/Ar Gas |
The 1st International Symposium on Advanced Magnetic Materials |
2007 |
|
Dry Etching of IZO Thin Films Using a HBr/Ar Plasma |
14th International Symposium on Intercalation Compounds, Seoul, Korea. |
2007 |
|
Preparation of flexible dye sensitized solar cell treated by UV irradiation with indium zinc oxide electrodes |
The 2nd Korea-Japan Bilateral Workshop on Dye-sensitized and Oganic Solar Cells, KIST, Seoul, Korea |
2007 |
|
Etch Characteristic of Gallium Indium Zinc Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching in Chlorined Based Gases |
The 29th International Symposium on Dry Process |
2007 |
|
Effect of C2F6 Gas on Etch Profile of Magnetic Tunnel Junction Stack in Cl2/Ar and HBr/Ar Gas Mixures |
The 29th International Symposium on Dry Process |
2007 |
|
Effect of Deposition Parameters on Properties of Indium Zinc Oxide Thin Films for Application to Flexible Dye Sensitized Solar Cell Prepared at Low Temperature |
The 29th International Symposium on Dry Process |
2007 |
|
Characteristics of Indium Zinc Oxide Thin Films Deposited by Radio Frequency Reactive Magnetron Sputtering for Solar Cells Application |
Solid State Phenomena |
2007 |
|
Dry Etching of Magnetic Tunnel Junction Stack Using a High Density Plasma of a Cl2/Ar Gas Mix |
14th International Symposium on Intercalation Compounds, Seoul, Korea |
2007 |
|
Inductively Coupled Plasma Reactive Ion Etching of GeSbTe Thin Films in a HBr/Ar Gas |
The 18th International Symposium on Integrated Ferroelectrics |
2006 |
|
High Density Plasma Etching of IrRu Thin Films as a New Electrode for FeRAM |
The 18th International Symposium on Integrated Ferroelectrics |
2006 |
|
FABRICATION OF MAGNETIC TUNNEL JUNCTION STACK USING HIGH DENSITY PLASMA ETCHING IN Cl2/Ar AND BCl3/Ar GASES |
The 18th International Symposium on Integrated Ferroelectrics |
2006 |
|
Characteristics of Indium Zinc Oxide Thin films Deposited by Radio Frequency Reactive Magnetron Sputtering for Solar Cells Application |
IUMRS-ICA 2006 |
2006 |
|
Etch Characteristics of Magnetic Tunnel Junction Stacks in a High Density Plasma Using Chlorine-based gases |
IUMRS-ICA 2006 |
2006 |
|
Inductively Coupled Plasma Reactive Ion Etching of Titanium Nitride Thin Films in a Cl2/Ar Plasma |
IUMRS-ICA 2006 |
2006 |
|
Investigation on Etch Characteristics of Magnetic Tunnel Junction Stacks with Nanometer-Sized Patterns for Magnetic Random Access Memory |
The 28th International Symposium on Dry Process |
2006 |
|
Inductively coupled plasma reactive ion etching of ZnO films in HBr/Ar plasma |
The 28th International Symposium on Dry Process |
2006 |
|
Etch Characteristics of Nickel Oxide and Nickel Using Inductively Coupled Plasma Reactive Ion Etching for Oxide Resistive Random Access Memory (OxRRAM) Application |
The 28th International Symposium on Dry Process |
2006 |
|
Etch Characteristics of CoFeSiB Magnetic Films by Inductively Coupled Plasma Reactive Ion Etching for Magnetic Random Access Memory |
The 17th International Symposium on Integrated Ferroelectrics |
2005 |
|
Investigation on Etch Characteristics Of GeSbTe Thin Films for Phase-Change Memory |
The 17th International Symposium on Integrated Ferroelectrics |
2005 |
|
Electrical Characterization of Nickel Oxide Thin Films Deposited by Reactive Sputtering for Memory Application |
The 17th International Symposium on Integrated Ferroelectrics |
2005 |
|
Formation of Si Nanostructure by Dry Etching Using Self-Organized Metal Oxide Nanopillar Mask |
The 17th International Symposium on Integrated Ferroelectrics |
2005 |
|
Metal-Insulator Transitions In Polycrystalline VOx Thin Films |
The 17th International Symposium on Integrated Ferroelectrics |
2005 |
|
Synthesis of nanodot arrays using self-assembled niobium oxide nanopillar mask by reactive ion etching |
The 4th Asia-Pacific Chemical Reaction Engineering Symposium |
2005 |
|
Inductively coupled plasma reactive ion etching of Co2MnSi magnetic films for magnetic random access memory |
The 4th Asia-Pacific Chemical Reaction Engineering Symposium |
2005 |
|
HIGH DENSITY PLASMA ETCHING OF CoFeSiB MAGNETIC FILMS WITH HARD MASK |
International Symposium on Spintronics and Advanced Magnetic Technologies and International Symposium on Magnetic Materials and Applications |
2005 |
|
NANOMETER-SIZED ETCHING OF MAGNETIC TUNNEL JUNCTION STACK FOR MAGNETIC RANDOM ACCESS MEMORY |
International Symposium on Spintronics and Advanced Magnetic Technologies and International Symposium on Magnetic Materials and Applications |
2005 |
|
Nanometer-Sized Etching of Polysilicon Thin Films in a High Density Plasma |
The 50th AVS International Symposium |
2003 |
|
Etch characteristics of CoZrNb and CoFeTb magnetic films in a high density plasma |
2003 International Symposium on Magnetic Materials |
2003 |
|
Bi3.25La0.75Ti3O12 Thin Films Prepared on Pt/Ti/SiO2/Si(100) by Chemical Solution Deposition |
APPChE |
2003 |
|
Inductively Coupled Plasma Etching of Pb(ZrXTi1-X)O3 Thin Film in a HBr/Ar Plasma |
Korea-Japan symposium |
2002 |
|
Bi3.25La0.75Ti3O12 Thin Films Prepared on Pt/Ti/SiO2/Si(100) by Chemical Solution Deposition |
APPChE, Sept., 2002, Christchurch, New Zealand |
2002 |
|
Ferroelectric Emission Studies for Electron Emission Lithography Application |
Proceedings of the 14th IEEE ISIF Vol. I |
2001 |
|
Inductively Coupled Plasma Etching of Pb(ZrXTi1-x)O3 Thin Films in Cl2/C2F6/Ar and HBr/Ar Plasmas |
Proceeding of JECS, USA |
2001 |
|
Pt/PZT/TiO2 Gate Stack Etching by Using TiO2 Hard Mask for Metal-Ferroelectric-Insulator-Semiconductor FETs |
198th International Electrochem. Soc. meeting |
1999 |
|
Crystallization and Electrical Properties of Bi4Ti3O12 Films Derived from Bismuth Acetate and Bismuth Nitrate Precursor Solutions |
MRS Symposium Proceedings, Fall Meeting, Vol 493 |
1998 |
|
Investigation of Etch profiles in etching of PZT and Pt thin films |
MRS Symposium Proceedings, Fall Meeting, Vol 493 |
1998 |
|
Preparation and Characterization of PZT Thin Films on RuOX/Pt Multilayered Electrode by MOCVD |
MRS Symposium Proceedings, Fall Meeting, Vol 446 |
1997 |
|
Dry Etching of Pt/Pb(ZrXTi1-X)O3/Pt Thin Film Capacitors in an Inductively Coupled Plasma (ICP) for Nonvolatile Semiconductor Memory Applications |
Materials Research Society Symposium Proceedings, Fall Meeting, Vol 446 |
1997 |
|
Formation of Metal-Ferroelectric-Insulator-Semiconductor Structure for Single Transistor Memory |
The 52nd Symp.on Semiconductors and IC Tech |
1997 |
|
Characterization of Sol-Gel Precursor Solutions for the preparation of Pb(ZrXTi1-X)O3 Thin Films |
Proceedings of '97 KIChE, Fall Meeting, Vol.3 |
1997 |
|
Fabrication of Ferroelectric Capacitors Using RuO2/Pt Electrode |
Proceedings of the Tenth IEEE ISIF Vol. I, |
1996 |
|
Reactive Ion Etching Damage to Ferroelectric Thin Films Capacitors |
- MRS Symposium Proceedings, Fall Meeting, Vol 361 |
1995 |
|
The Characterization and Electrical Properties of Doped PZT Thin Films prepared by Sol-Gel Processing |
MRS Symposium Proceedings, Fall Meeting, Vol 361 |
1995 |
|
Study on Multilayered Electrodes for Ferroelectric Thin Film Capacitors |
MRS Symposium Proceedings, Fall Meeting, Vol 361 |
1995 |
|
Electrode Stress Effects on Electrical Properties of PZT Thin Film Capacitors |
Proceedings of the Ninth IEEE ISIF, |
1994 |