International Journals
Title | Journal Name | Year |
Nanometer-scale etching of copper thin films in high-density plasma of an ethylenediamine/acetic acid/argon gas mixture | J. Vac. Sci. Technol. B | 2022 |
| Pulse-Modulated Plasma Etching of Copper Thin Films via CH3COOH/Ar | Journal of Nanoscience and Nanotechnology | 2021 |
| Inductively coupled plasma reactive ion etching | Vacuum | 2020 |
| Cyclic etching of copper thin films using HBr and Ar gases | J. Vac. Sci. Technol. A | 2020 |
| Etch Characteristics of Micrometer-Scale Masked Cu Thin Films Using Inductively Coupled Plasma of H2/Ar | Journal of Nanoscience and Nanotechnology | 2020 |
| Evolution of etch profile of copper thin films in high density plasmas of alcohol-based gases. | Vacuum | 2019 |
| Dry Etching of copper thin films in high density plasma of CH3COOH/Ar | Thin Solid films | 2018 |
| Etch characteristics of copper thin films in high density plasma of CH4/O2/Ar gas mixture | Thin Solid films | 2018 |
Influence of C2F6 addition to Cl2/Ar gas on nanometer-scale etch characteristics of TiN thin films using inductively coupled plasma | ElectroChemical Society | 2018 |
| Nanometer-scale etching of CoFeB thin films using pulse-modulated high density plasma | Current Applied Physics | 2018 |
| Dry etching of palladium thin films in high density plasmas of CH3OH/Ar, C2H5OH/Ar, CH4/Ar, and CH4/O2/Ar gas mixtures | Thin Solid films | 2017 |
| Anisotropic etching of CoFeB magnetic thin films in C2H5OH/Ar plasma | Thin Solid films | 2017 |
| Investigation on etching characteristics of Pd thin films using CH3COOH/Ar gas | Thin Solid films | 2017 |
| Highly anisotropic etching of Ta thin films using high density plasmas of halogen based gases | Vacuum | 2016 |
| Influence of Selenization Pressure on Properties of CIGS Absorber Layer Prepares by RF Sputtering | Current Photovoltaic Research | 2016 |
Etch Characteristics of Ru Thin Films Using O2/Ar, CH4/Ar, and O2/CH4/Ar Plasmas | Thin Solid Films | 2016 |
Effect of process pressure and substrate temperature on CdS buffer layers deposited by using RF sputtering for Cu(In, Ga)Se2 solar cells | Journal of the Korean Physical Society | 2016 |
Novel spherical TiO2 aggregates with diameter of 100nm for efficient mesoscopic perovskite solar cells | Nano Energy | 2016 |
Characterization of Zn(O, S) Buffer Layers for Cu(In, Ga)Se2 Solar Cells | Journal of Nanoscience and Nanotechnology | 2016 |
Inductively Coupled Plasma Reactive Ion Etching of Magnetic Tunnel Junction Stacks in a CH3COOH/Ar Gas | ECS Solid State Letters | 2015 |
Inductively coupled plasma reactive ion etching of CoFeB magnetic thin films in a CH3COOH/Ar gas mixture | Vacumm | 2015 |
Influence of oxygen on characteristics of Zn(O, S) thin films deposited by RF magnetron sputtering | J. Vac. Sci. Technol. A | 2015 |
Effect of O2 on etch characteristics of Co2MnSi thin films in CH4/O2/Ar gas mixture | J. Vac. Sci. Technol. A | 2015 |
High density plasma reactive ion etching of Ru thin films using non-corrosive gas mixture | Thin Solid Films | 2015 |
Inductive couple plasma reactive ion etching characteristics of TiO2 thin films | Thin Solid Films | 2015 |
Dry etching of Co2MnSi magnetic thin films using a CH3OH/Ar based inductively coupled plasma | Vacumm | 2015 |
Influence of Post- treatment on properties of Cu(In,Ga)Se2 thin films deposited by RF magnetron sputtering using a quaternary sincgle target for photovoltaic devices | Thin Solid Films | 2014 |
Etch characteristics of MgO thin films in Cl2/Ar, CH3OH/Ar and CH4/Ar plasmas | VACUUM | 2014 |
Characteristics of CdS Thin Films Deposited on Glass and Cu(In,Ga)Se2 Layer Using Chemical Bath Deposition | Thin Solid Films
| 2013 |
Inductively Coupled Plasma Reactive Ion Etching of Magnetic Tunnel Junction Stacks Using H2O/CH4 Mixture | Thin Solid Films
| 2013 |
Structural and electrical properties of radio frequency magnetron sputtered Cu(InxGa1-x)Se2 thin films with additional post-heat treatment | Thin Solid Films
| 2013 |
Investigation on Etch Characteristics of FePt Thin Films Using a H2O/Ar Plasma | Microelectronic Engineering | 2013 |
Influence of O2 Gas on Etch Profile of Magnetic Tunnel Junction Stacks Etched in a CH4/O2/Ar Plasma | CS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY | 2012 |
Inductively coupled plasma reactive ion etching of FePt magnetic thin films in a CH4/O2/Ar plasma | THIN SOLID FILMS | 2012 |
Effect of the Annealing Process on CuInS2 Thin Films Prepared by Using Aerosol Jet Deposition | J. KOREAN PHYS. SOC | 2012 |
Characterization of CuInS2 thin films prepared by aerosol jet deposition | THIN SOLID FILMS | 2012 |
Inductively coupled plasma reactive ion etching of IrMn magnetic thin films using a CH4/O2/Ar gas | THIN SOLID FILMS | 2012 |
High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma | THIN SOLID FILMS | 2012 |
Evolution of Etch Profile of Magnetic Tunnel Junction Stacks Etched in a CH3OH/Ar Plasma | J. ELECTROCHEM. SOC. | 2012 |
High density plasma reactive ion etching of CoFeB magnetic thin films using a CH4/Ar plasma | THIN SOLID FILMS | 2011 |
Inductively Coupled plasma Reactive Ion Etching of IrMn Magnetic | THIN SOLID FILMS | 2011 |
Etch Characteristics of IrMn Thin Films Using an Inductively Coupled Plasma of CH3OH/Ar | THIN SOLID FILMS | 2011 |
Etch characteristics of FePt magnetic thin films using inductively coupled plasma reactive ion etching | THIN SOLID FILMS | 2011 |
Evolution of etch profile in etching of CoFeB thin films using high density plasma reactive ion etching | THIN SOLID FILMS | 2011 |
Investigation on etch characteristics of MgO thin films using a HBr/Ar plasma | THIN SOLID FILMS | 2011 |
Growth Mechanism of CdS NanoFilms Prepared by Chemical Bath Deposition | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | 2011 |
Investigation on Etch Characteristics of Nanometer-Sized Magnetic Tunnel Junction Stacks Using a HBr/Ar Plasma | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | 2011 |
Performance Improvement of Dye-Sensitized Solar Cells by Surface Patterning of Fluorine-doped Tin Oxide Transparent Electrodes | THIN SOLID FILMS | 2011 |
Characteristics of Indium Zinc Oxide Thin Films Prepared by Direct Current Magnetron Sputtering For Flexible Solar Cells | SOLAR ENERGY MATERIAL & SOLAR CELLS | 2011 |
Inductively Coupled Plasma Reactive Ion Etching of Titanium Thin Films Using a Cl2/Ar Gas | VACUUM | 2010 |
Etch Characteristics of Gallium Indium Zinc Oxide Thin Films in a HBr/Ar Plasma | SURFACE & COATINGS TECHNOLOGY | 2010 |
Inductively Coupled Plasma Reactive Ion Etching of Gallium Indium Zinc Oxide Thin Films Using Cl2/Ar Gas Mix | J. JAPAN. APPL. PHYS | 2010 |
Etch Characteristics of Indium Zinc Oxide Thin Films in a C2F6/Ar Plasma | THIN SOLID FILMS | |
Etch characteristics of indium zinc oxide thin films using inductively coupled plasma of a Cl2/Ar gas | THIN SOLID FILMS | 2009 |
Inductively Coupled Plasma Etching of Indium Zinc Oxide Thin Films with HBr/Ar Discharges | J. ELECTROCHEM. SOC. | 2008 |
Effect of oxygen concentration on properties of indium zinc oxide thin films for flexible dye-sensitized solar cell | JPN J. APPL. PHYS. | 2008 |
Inductively coupled plasma reactive ion etching of ZnO films in HBr/Ar plasma | THIN SOLID FILMS | 2008 |
Etch characteristics of magnetic tunnel junction stack with nanometer-sized patterns for magnetic random access memory | THIN SOLID FILMS | 2008 |
Fabrication of carbon nanotube paste using photosensitive polymer for field emission display | COLLOIDS AND SURFACES A | 2008 |
Etch Characteristics of Nickel Oxide Thin Films Using Inductively Coupled Plasma Reactive Ion Etching for Oxide Resistive Random Access Memory Application | ELECTROCHEMICAL AND SOLID-STATE LETTERS | 2008 |
Etch Characteristics of Magnetic Tunnel Junction Stack Using a High Density Plasma in a HBr/Ar gas | PHYSICA STATUS SOLID | 2007 |
Effect of O2 Concentration on Metal-Insulator Transition Properties of Vanadium Oxide Thin Films Prepared by Radio Frequency Magnetron Sputtering | THIN SOLID FILMS | 2007 |
Characteristics of Indium Zinc Oxide Thin Films Deposited by Radio Frequency Reactive Magnetron Sputtering for Solar Cells Application | SOLID STATE PHENOMENA | 2007 |
Inductively Coupled Plasma Reactive Ion Etching of GeSbTe Thin Films in a HBr/Ar Gas | INTEGRATED FERROELECTRICS | 2007 |
High Density Plasma Etching of IrRu Thin Films as a New Electrode for FeRAM | INTEGRATED FERROELECTRICS | 2006 |
High Density Plasma Etching of Amorphous CoZrNb Films for Thin Film Magnetic Devices | THIN SOLID FILMS | 2006 |
Synthesis of nanodot arrays using self-assembled niobium oxide nanopillar mask by reactive ion etching | STUDIES IN SURFACE SCIENCE AND CATALYSIS | 2006 |
Inductively coupled plasma reactive ion etching of Co2MnSi magnetic films for magnetic random access memory | STUDIES IN SURFACE SCIENCE AND CATALYSIS | 2006 |
Inductively coupled plasma reactive ion etching of Co2MnSi magnetic films for magnetic random access memory | STUDIES IN SURFACE SCIENCE AND CATALYSIS | 2006 |
Etch characteristics of CoFeSiB magnetic films using inductively coupled plasma reactive ion etching for magnetic random access memory | INTEGRATED FERROELECTRICS | 2006 |
Formation of Si nanostructures using dry etching with self-organized metal oxide nanopillar masks | INTEGRATED FERROELECTRICS | 2006 |
Metal-insulator transitions in polycrystalline VOx thin films | INTEGRATED FERROELECTRICS | 2006 |
Investigation on etch characteristics of GeSbTe thin films for phase-change memory | INTEGRATED FERROELECTRICS | 2006 |
Nanometer-sized etching of magnetic tunnel junction stack for magnetic random access memory | J. MAGNETISM AND MAGNETIC MATERIALS | 2006 |
High-density plasma etching of CoFeSiB magnetic films with hard mask | J. MAGNETISM AND MAGNETIC MATERIALS | 2006 |
High Density Plasma Etching of IrRu Thin Films as a New Electrode for FeRAM | INTEGRATED FERROELECTRICS | 2006 |
ELECTRICAL CHARACTERIZATION OF NICKEL OXIDE THIN FILMS DEPOSITED BY REACTIVE SPUTTERING FOR MEMORY APPLICATIONS | INTEGRATED FERROELECTRICS | 2005 |
Shape Change of Self-Organized NbOx Nanopillar Arrays by High Density Plasma Etching | ELECTROCHEMICAL AND SOLID-STATE LETTERS | 2005 |
Effect of Different Film Preparation Procedures on the Thermal, Morphological and Mechanical Properites of Pure and Calcite-Filled HDPE Films | JOURNAL OF APPLIED POLYMER SCIENCE | 2004 |
Influence of Etch Gas on High Density Plasma Etching of Polysilicon Thin Films with Nanometer-Sized Patterns | ELECTROCHEMICAL AND SOLID-STATE LETTERS | 2004 |
Influence of Wet Chemical Cleaning on Properties of Magnetic Tunnel Junction Stack for Magnetic RAM | ELECTROCHEMICAL AND SOLID-STATE LETTERS | 2004 |
Synthesis of Si Nanostructures via Self-organization Pillar Mask | CHEMISTRY MATERIALS | 2004 |
Etch characteristics of CoZrNb and CoTb magnetic thin films in a high density plasma | PHYS. STAT. SOL.(A) | 2004 |
Nonlithographic SiO2 nanodot arrays via template synthesis approach | JPN. J. APPL. PHYS. | 2004 |
Influence of Process Parameters on the Characteristics of Indium Zinc Oxide Thin Films Deposited by DC magnetron Sputtering | THIN SOLID FILMS | 2004 |
Nanometer-sized patterning of polysilicon thin films by high density plasma etching | THIN SOLID FILMS | 2004 |
Effect of La Doping on Structural and Electrical Properties of Ferroelectric Bi4-XLaXTi3O12 Thin Films Prepared by Chemical Solution Deposition | THIN SOLID FILMS | 2003 |
High Density Plasma Etching of Iridium Thin Films in a Cl2/O2/Ar Plasma | J. ELECTROCHEM. SOC | 2003 |
Effect of Etch Gas on Dry Etching of Ferroelectric Bi3.25La0.75Ti3O12 Thin Films | JPN. J. APPL. PHYS. | 2003 |
Etch characteristics of Ferroelectric (Bi4-xLaX)Ti3O12 Thin Films in an Inductively Coupled Plasma | INTEGRATED FERROELECTICS | 2002 |
Inductively coupled plasma etching of a Pb(ZrXTi1-X)O3 thin film in a HBr/Ar plasma | MICROELECTRONIC ENGINEERING, 63, 353-361 | 2002 |
Effect of Etch Gases on Iridium Etching Using a Hard Mask | INTEGRATED FERROELECTICS, 39, 119 | 2001 |
Etch Behavior of PZT films Using a TiO2 Hard Mask | J. ELECTROCHEM. SOC. 148, C353 | 2001 |
Etch Characteristics of Iridium in Chlorine-Containing and Fluorine-Containing Gas Plasmas | J. VAC. SCI.AND TECHNOL. A 19, 2400 | 2001 |
Platinum etching by using a TiO2 hard mask in O2/Cl2/Ar plasma | J. VAC. SCI. AND TECHNOL. A 18, 835 | 2000 |
Effect of Pre-Annealing on Physical and Electrical Properties of SrBi2Ta2O9 Thin Films Prepared by Chemical Solution Deposition | THIN SOLID FILMS, 354, 111 | 1999 |
Reactive Ion Etching of Pb(ZrXTi1-X)O3 Thin Films in an Inductively Coupled Plasma | J. VAC. SCI. AND TECHNOL. B 16, 1894 | 1998 |
Study on Fence-Free Platinum etching Using Chlorine-Based Gases in Inductively Coupled Plasma | J. ELECTROCHEM. SOC., 144, L294 | 1997 |
Effects of Substrate Modification on the Growth and Characteristics of MOCVD PZT | INTEGRATED FERROELECTRICS, 17, 67 | 1997 |
Fabrication and Comparison of Ferroelectric Capacitor Structures for Memory Applications | INTEGRATED FERROELECTRICS, 16, 139 | 1997 |
Integration of Ferroelectric Capacitors using Multilayered Electrode | INTEGRATED FERROELECTRICS, 16, 97 | 1997 |
Etching Effects to PZT Capacitors with RuOX/Pt Electrode by using Inductively Coupled Plasma | INTEGRATED FERROELECTRICS, 16, 149 | 1997 |
Effects of Oxide Electrode on PbZrXTi1-XO3 Thin Films Prepared by Metalorganic Chemical Vapor Deposition | JPN. J. APPL. PHYS., 36, 72 | 1997 |
Etching Effects on Ferroelectric Capacitors with Multilayered Electrodes | JPN. J. APPL. PHYS.,36, 2747 | 1997 |
Study on Property Variation due to the Interface between PZT and Electrode | INTEGRATED FERROELECTRICS, 13, 97 | 1996 |
Etching Effects on Ferroelectric Capacitors with Multilayered Electrodes | INTEGRATED FERROELECTRICS, 13, 129 | 1996 |
Dry Etching of Pt/Pb(ZrXTi1-X)O3/Pt Thin Film Capacitors in an Inductively Coupled Plasma (ICP) | INTEGRATED FERROELECTRICS, 11, 259 | 1995 |
Reactive Cluster Beam Etching of Fine Patterns | APPL. PHYS. LETT., 63(24), 3 341 | 1993 |